Emkhakheni wokukhiqiza ama-semiconductor, njengemishini eyinhloko enquma ukunemba kwenqubo yokukhiqiza ama-chip, ukuzinza kwendawo yangaphakathi yomshini we-photolithography kubaluleke kakhulu. Kusukela ekuvuseleleni umthombo wokukhanya we-ultraviolet odlulele kuya ekusebenzeni kwepulatifomu yokunyakaza kokunemba kwe-nanoscale, akunakuba nokuphambuka okuncane kuzo zonke izixhumanisi. Izisekelo ze-granite, ezinochungechunge lwezakhiwo ezihlukile, zibonisa izinzuzo ezingenakuqhathaniswa ekuqinisekiseni ukusebenza okuzinzile kwemishini ye-photolithography nokuthuthukisa ukunemba kwe-photolithography.
Ukusebenza okuhle kakhulu kokuvikela i-electromagnetic
Ingaphakathi lomshini we-photolithography ligcwele indawo eyinkimbinkimbi ye-electromagnetic. Ukuphazamiseka kwe-electromagnetic (EMI) okukhiqizwa yizingxenye ezifana nemithombo yokukhanya ye-ultraviolet eyeqile, ama-drive motors, kanye namandla kagesi aphezulu, uma kungalawulwa kahle, kuzothinta kakhulu ukusebenza kwezingxenye ze-elekthronikhi ezinembile kanye nezinhlelo zokukhanya ngaphakathi kwemishini. Isibonelo, ukuphazamiseka kungabangela ukuphambuka okuncane kumaphethini we-photolithography. Ezinqubweni zokukhiqiza ezithuthukisiwe, lokhu kwanele ukuholela ekuxhumaneni okungalungile kwe-transistor ku-chip, okunciphisa kakhulu ukukhiqizwa kwe-chip.
I-Granite ayiyona into yensimbi futhi ayiqhubi ugesi ngokwayo. Akukho mkhuba wokungeniswa kwe-electron obangelwa ukuhamba kwama-electron akhululekile ngaphakathi njengasezintweni zensimbi. Lesi sici senza kube umzimba wemvelo wokuvikela i-electron, ongavimba ngempumelelo indlela yokudlulisela ukuphazamiseka kwe-electron yangaphakathi. Lapho insimu yamagnetic eshintshanayo ekhiqizwa umthombo wokuphazamiseka kwe-electron wangaphandle isakazeka esisekelweni se-granite, njengoba i-granite ingeyona i-magnetic futhi ayikwazi ukuba yi-magnetized, insimu yamagnetic eshintshanayo kunzima ukungena kuyo, ngaleyo ndlela ivikele izingxenye eziyinhloko zomshini we-photolithography ofakwe esisekelweni, njengezinzwa zokunemba namadivayisi okulungisa ilensi ye-optical, ethonyeni lokuphazamiseka kwe-electromagnetic nokuqinisekisa ukunemba kokudluliselwa kwephethini ngesikhathi senqubo ye-photolithography.
Ukuhambisana okuhle kakhulu kwe-vacuum
Ngenxa yokuthi ukukhanya okukhulu kwe-ultraviolet (EUV) kumuncwa kalula yizo zonke izinto, okuhlanganisa nomoya, imishini ye-lithography ye-EUV kumele isebenze endaweni engenagesi. Kuleli qophelo, ukuhambisana kwezingxenye zemishini nendawo engenagesi kuba yinto ebaluleke kakhulu. Endaweni engenagesi, izinto zingancibilikisa, zisuse futhi zikhiphe igesi. Igesi ekhishwe ayigcini nje ngokumunca ukukhanya kwe-EUV, inciphise amandla nokusebenza kahle kokudlulisa ukukhanya, kodwa futhi ingangcolisa amalensi okukhanya. Isibonelo, umhwamuko wamanzi ungaxuba amalensi, futhi ama-hydrocarbon angabeka izendlalelo zekhabhoni kumalensi, okuthinta kakhulu ikhwalithi ye-lithography.
I-Granite inezakhiwo zamakhemikhali ezizinzile futhi ayikhiphi igesi endaweni ye-vacuum. Ngokusho kokuhlolwa kobungcweti, endaweni ye-vacuum yomshini we-photolithography elingisiwe (njengendawo ye-vacuum ehlanzekile kakhulu lapho uhlelo lokukhanya olukhanyayo kanye nohlelo lwe-imaging optical ekamelweni eliyinhloko kutholakala khona, okudinga i-H₂O < 10⁻⁵ Pa, CₓHᵧ < 10⁻⁷ Pa), izinga lokukhipha igesi lesisekelo se-granite liphansi kakhulu, liphansi kakhulu kunelezinye izinto ezifana nezinsimbi. Lokhu kwenza ingaphakathi lomshini we-photolithography ligcine izinga eliphezulu le-vacuum kanye nokuhlanzeka isikhathi eside, ukuqinisekisa ukuhanjiswa okuphezulu kokukhanya kwe-EUV ngesikhathi sokudlulisa kanye nendawo yokusetshenziswa ehlanzekile kakhulu yamalensi optical, kwandise impilo yesevisi yohlelo lwe-optical, futhi kuthuthukisa ukusebenza okuphelele komshini we-photolithography.
Ukumelana okunamandla kokudlidliza kanye nokuqina kokushisa
Ngesikhathi senqubo ye-photolithography, ukunemba ezingeni le-nanometer kudinga ukuthi umshini we-photolithography akufanele ube nokudlidliza okuncane noma ukuguqulwa kokushisa. Ukudlidliza kwemvelo okubangelwa ukusebenza kweminye imishini kanye nokunyakaza kwabasebenzi eshabhu, kanye nokushisa okukhiqizwa umshini we-photolithography uqobo ngesikhathi sokusebenza, konke kungaphazamisa ukunemba kwe-photolithography. I-Granite inobukhulu obukhulu kanye nokuthungwa okuqinile, futhi inokumelana okuhle kakhulu kokudlidliza. Isakhiwo sayo sangaphakathi sekristalu yamaminerali sincane, esinganciphisa ngempumelelo amandla okudlidliza futhi sicindezele ngokushesha ukusabalala kokudlidliza. Idatha yokuhlola ikhombisa ukuthi ngaphansi komthombo ofanayo wokudlidliza, isisekelo se-granite singanciphisa ubukhulu bokudlidliza ngaphezu kuka-90% ngaphakathi kwemizuzwana engu-0.5. Uma kuqhathaniswa nesisekelo sensimbi, singabuyisela imishini ekuzinzeni ngokushesha, siqinisekise indawo eqondile phakathi kwelensi ye-photolithography kanye ne-wafer, futhi sigweme ukufiphala kwephethini noma ukungalungi okubangelwa ukudlidliza.
Okwamanje, i-coefficient yokwanda kokushisa kwe-granite iphansi kakhulu, cishe (4-8) ×10⁻⁶/℃, okuphansi kakhulu kunezinto zensimbi. Ngesikhathi sokusebenza komshini we-photolithography, noma ngabe izinga lokushisa langaphakathi liyashintshashintsha ngenxa yezici ezifana nokukhiqizwa kokushisa okuvela emthonjeni wokukhanya kanye nokungqubuzana okuvela ezingxenyeni zemishini, isisekelo se-granite singagcina ukuzinza kobukhulu futhi ngeke siguqulwe kakhulu ngenxa yokwanda nokuncipha kokushisa. Inikeza ukwesekwa okuzinzile nokuthembekile kohlelo lokukhanya kanye nepulatifomu yokunyakaza okunembile, igcina ukuhambisana kokunemba kwe-photolithography.
Isikhathi sokuthunyelwe: Meyi-20-2025