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Emkhakheni wokukhiqizwa kwe-semiconductor, njengemishini eyinhloko enquma ukunemba kwenqubo yokukhiqiza ama-chip, ukuzinza kwendawo yangaphakathi yomshini we-photolithography kubaluleke kakhulu. Kusukela ekusaseni komthombo wokukhanya kwe-ultraviolet okwedlulele kuya ekusebenzeni kweplathifomu yokunyakaza yokunemba kwe-nanoscale, angeke kube khona ukuchezuka nokuncane kuso sonke isixhumanisi. Izisekelo ze-granite, ezinochungechunge lwezakhiwo eziyingqayizivele, zibonisa izinzuzo ezingenakuqhathaniswa ekuqinisekiseni ukusebenza okuzinzile kwemishini ye-photolithography kanye nokuthuthukisa ukunemba kwe-photolithography. .
Ukusebenza okuvelele kokuvikela i-electromagnetic
Ingaphakathi lomshini we-photolithography ligcwele indawo eyinkimbinkimbi ye-electromagnetic. I-Electromagnetic interference (EMI) ekhiqizwa izingxenye ezifana nemithombo yokukhanya kwe-ultraviolet eyeqisayo, ama-drive motors, nezinto ezinikezwa amandla amaza aphezulu, uma zingalawulwa ngempumelelo, zizophazamisa kakhulu ukusebenza kwezingxenye ze-elekthronikhi ezinembayo nezinhlelo zokubona ngaphakathi kwemishini. Isibonelo, ukuphazamiseka kungase kubangele ukuphambuka okuncane kumaphethini we-photolithography. Ezinqubweni zokukhiqiza ezithuthukisiwe, lokhu kwanele ukuholela ekuxhumekeni okungalungile kwe-transistor ku-chip, kunciphisa kakhulu isivuno se-chip. .
I-Granite iyimpahla engeyona eyensimbi futhi ayiwuhambisi ugesi ngokwayo. Ayikho i-electromagnetic induction induction ebangelwa ukunyakaza kwama-electron amahhala ngaphakathi njengasezintweni zensimbi. Lesi sici siwenza umzimba wemvelo ovikela u-electromagnetic, ongavimba ngempumelelo indlela yokudlulisela yokuphazanyiswa kwe-electromagnetic yangaphakathi. Lapho inkambu kazibuthe eshintshanayo ekhiqizwe umthombo wangaphandle wokuphazamiseka kazibuthe usakazeka esisekelweni segwadle, njengoba igwadle lingewona uzibuthe futhi alikwazi ukugaywa uzibuthe, indawo kazibuthe eshintshanayo kunzima ukungena kuyo, ngaleyo ndlela ivikela izingxenye eziyinhloko zomshini we-photolithography ofakwe esisekelweni, njengezinzwa zokunemba kanye nethonya lokunemba kwelensi ye-electromagnetic kusuka ku-electromagnetic lens ukulungiswa kwe-electromagnetic ukudluliswa kwephethini phakathi nenqubo ye-photolithography. .
Ukuhambisana okuhle kwe-vacuum
Ngenxa yokuthi ukukhanya kwe-ultraviolet (i-EUV) kumunca kalula yizo zonke izinto, okuhlanganisa nomoya, imishini ye-EUV lithography kufanele isebenze endaweni engenalutho. Kuleli qophelo, ukuhambisana kwezingxenye zemishini nendawo ye-vacuum kubaluleke kakhulu. Ku-vacuum, izinto zingase zincibilike, zichithe futhi zikhiphe igesi. Igesi ekhishiwe ayimumbi nje ukukhanya kwe-EUV kuphela, yehlise ukushuba nokusebenza kahle kokudlulisela kokukhanya, kodwa futhi ingase ingcolise amalensi okukhanya. Isibonelo, umhwamuko ungakhipha i-oxidize amalensi, futhi ama-hydrocarbon angafaka izendlalelo zekhabhoni kumalensi, okulimaza kakhulu ikhwalithi ye-lithography. .
I-Granite inamakhemikhali azinzile futhi ayikhiphi nhlobo igesi endaweni ye-vacuum. Ngokusho kokuhlolwa kochwepheshe, endaweni yokulingisa yomshini wokuthwebula izithombe (efana nemvelo ecwebe kakhulu yevacuum lapho isistimu yokukhanya yokukhanyisa kanye nesistimu ye-imaging optical ekamelweni elikhulu kutholakala, edinga u-H₂O < 10⁻⁵ Pa, CₓHᵧ < 10⁻ izinga eliphansi kakhulu lesisekelo esikude, isisekelo esiphansi kakhulu se-Pa. kunezinye izinto ezifana nezinsimbi. Lokhu kuvumela ingaphakathi lomshini we-photolithography ukuthi ligcine izinga eliphezulu le-vacuum nokuhlanzeka isikhathi eside, iqinisekisa ukudluliswa okuphezulu kokukhanya kwe-EUV ngesikhathi sokudlulisela kanye nendawo yokusetshenziswa ehlanzekile kakhulu yamalensi okubona, okunweba impilo yesevisi yesistimu yokubona, kanye nokuthuthukisa ukusebenza okuphelele komshini we-photolithography. .
Ukumelana nokudlidliza okuqinile nokuzinza kokushisa
Phakathi nenqubo ye-photolithography, ukunemba ezingeni le-nanometer kudinga ukuthi umshini we-photolithography akumele ube nokudlidliza nokuncane noma ukuwohloka kokushisa. Ukudlidliza kwemvelo okukhiqizwa ukusebenza kwezinye izinto zokusebenza kanye nokunyakaza kwabasebenzi ku-workshop, kanye nokushisa okukhiqizwa umshini we-photolithography ngokwawo ngesikhathi sokusebenza, kungase kuphazamise ukunemba kwe-photolithography. I-Granite inokuminyana okuphezulu nokuthungwa okuqinile, futhi inokumelana nokudlidliza okuhle kakhulu. Isakhiwo sayo sangaphakathi sekristalu yamaminerali sihlangene, esinganciphisa ngempumelelo amandla okudlidliza futhi sicindezele ngokushesha ukusakazeka kokudlidliza. Idatha yokuhlola ibonisa ukuthi ngaphansi komthombo ofanayo wokudlidliza, isisekelo segwadle singanciphisa i-amplitude yokudlidliza ngaphezu kuka-90% phakathi kwamasekhondi angu-0.5. Uma iqhathaniswa nesisekelo sensimbi, ingabuyisela okokusebenza ekuzinzeni ngokushesha okukhulu, iqinisekise ukuma okuqondile okuhlobene phakathi kwelensi ye-photolithography ne-wafer, futhi igwema ukufiphala kwephethini noma ukungahambi kahle okubangelwa ukudlidliza. .
Ngaleso sikhathi, i-coefficient yokunwetshwa okushisayo kwegwadle iphansi kakhulu, cishe (4-8) ×10⁻⁶/℃, ephansi kakhulu kunaleyo yezinto zensimbi. Ngesikhathi sokusebenza komshini we-photolithography, ngisho noma izinga lokushisa langaphakathi lishintshashintsha ngenxa yezinto ezifana nokukhiqizwa kokushisa okuvela emthonjeni wokukhanya kanye nokungqubuzana okuvela ezingxenyeni eziwumshini, isisekelo se-granite singagcina ukuqina kwe-dimensional futhi ngeke senze ukuguquguquka okubalulekile ngenxa yokwanda nokuncipha kwezinga lokushisa. Inikeza ukusekelwa okuzinzile nokuthembekile kwesistimu ye-optical kanye neplathifomu yokunyakaza okunembayo, igcina ukuvumelana kokunemba kwe-photolithography.
Isikhathi sokuthumela: May-20-2025